In the realm of advanced materials science, high-purity titanium tungsten sputtering targets play a pivotal role in the fabrication of cutting-edge thin films. These specialized targets are meticulously crafted to achieve exceptional purity levels, ensuring uniform and reproducible deposition characteristics. The synergistic combination of titanium

Gold sputtering targets are essential components in various thin-film deposition processes. These targets, typically crafted from high-purity gold, are utilized to deposit a thin layer of gold onto substrates in a controlled manner. The process involves bombarding the target with ions, causing atoms to be ejected and deposited onto the substrate. T